The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Aug. 25, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Tapashree Roy, Bangalore, IN;

Todd Egan, Fremont, CA (US);

Viswanath Bavigadda, Bengaluru, IN;

Nitin Gupta, Bangalore, IN;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G06F 18/214 (2023.01); G06N 20/00 (2019.01); H10P 72/00 (2026.01); H10P 72/30 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0604 (2026.01); G06F 18/214 (2023.01); G06N 20/00 (2019.01); H10P 72/3302 (2026.01);
Abstract

A method includes receiving, by a processing device, first data generated by a first sensor of a substrate processing system. The first data is generated responsive to the first sensor receiving electromagnetic radiation from a substrate held by a robot arm of a transfer chamber in the substrate processing system. The method further includes processing the first data to obtain second data. The second data includes a first indication of performance of the substrate processing system. The method further includes causing, in view of the second data, performance of a corrective actions associated with the substrate processing system.


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