The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Aug. 31, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Li-Hui Chen, Hsinchu County, TW;

Chun-Hung Chen, Hsinchu, TW;

Jhon Jhy Liaw, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 64/23 (2025.01); H10B 10/00 (2023.01); H10D 30/60 (2025.01); H10D 30/62 (2025.01); H10D 86/40 (2025.01); H10D 86/60 (2025.01); H10D 89/10 (2025.01);
U.S. Cl.
CPC ...
H10D 64/258 (2025.01); H10B 10/125 (2023.02); H10D 30/611 (2025.01); H10D 30/6215 (2025.01); H10D 30/6219 (2025.01); H10D 86/431 (2025.01); H10D 86/60 (2025.01); H10D 89/10 (2025.01);
Abstract

A first transistor includes a first gate, a first source/drain, and a first source/drain contact disposed over the first source/drain. The first gate has a first dimension measured in a first lateral direction. The first source/drain contact has a second dimension measured in the first lateral direction. A second transistor includes a second gate, a second source/drain, and a second source/drain contact disposed over the second source/drain. The second gate has a third dimension measured in the first lateral direction. The second source/drain contact has a fourth dimension measured in the first lateral direction. A first ratio of the first dimension and the second dimension is different from a second ratio of the third dimension and the fourth dimension.


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