The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Nov. 09, 2021
Lam Research Corporation, Fremont, CA (US);
Bradford J. Lyndaker, Lowville, NY (US);
Alexei Marakhtanov, Albany, CA (US);
Felix Leib Kozakevich, Sunnyvale, CA (US);
David Hopkins, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An RF signal supply system for plasma generation includes an RF signal generator, an impedance matching system, and a control module. The RF signal generator includes a control system. The impedance matching system has an input connected to an output of the RF signal generator, an output connected to a plasma processing system, a gamma control capacitor, and a frequency control capacitor. The control module is connected in data communication with each of the RF signal generator and the impedance matching system. The control module is programmed to transmit control signals to the impedance matching system based on corresponding data received from the control system of the RF signal generator, where the control signals direct control of the gamma control capacitor and the frequency control capacitor. The control module is also programmed to transmit data received from the impedance matching system to the control system of the RF signal generator.