The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Mar. 21, 2024
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Shinichi Machidori, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70825 (2013.01); G03F 7/707 (2013.01); G03F 7/70933 (2013.01);
Abstract

A substrate processing apparatus includes: a base including a drive mechanism; a cover enclosing the base; a lifting body protruding from an internal region enclosed by the cover to an external region outside the internal region, and moving up and down with respect to the base by the drive mechanism; a processing body that is connected to the lifting body in the external region, and processes a substrate; and a suction tube with a suction port for sucking particles generated from the drive mechanism.


Find Patent Forward Citations

Machidori, Shinichi. (2026). Substrate processing apparatus and substrate processing method (U.S. Patent No. 12625437). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12625437

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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