The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Jun. 17, 2022
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Masaki Tomita, Tokyo, JP;

Kentaro Yamamoto, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 21/08 (2006.01); C25D 17/02 (2006.01); C25D 17/06 (2006.01); C25D 21/12 (2006.01);
U.S. Cl.
CPC ...
C25D 21/08 (2013.01); C25D 17/02 (2013.01); C25D 17/06 (2013.01); C25D 21/12 (2013.01);
Abstract

Provided is a plating apparatus that allows cleaning a contact cleaning member. The plating apparatus includes: a plating tank configured to house a plating solution; a substrate holder configured to hold a substrate with a surface to be plated facing downward, the substrate holder including a contact member for feeding power to the substrate; a contact cleaning memberfor discharging a cleaning liquid to the contact member while the contact cleaning member is at a cleaning position between the plating tank and the substrate holder; a driving mechanismconfigured to move the contact cleaning memberbetween the cleaning position and a retracted position retracted from between the plating tank and the substrate holder; and a nozzle cleaning coverconfigured to cover an upper portion of the contact cleaning memberwhile the contact cleaning memberis at the retracted position.


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