The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Dec. 27, 2022
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Eunwoo Park, Gyeongsan-si, KR;

Jongwha Kang, Cheonan-si, KR;

Wooram Lee, Seoul, KR;

Sung-Gyu Lee, Cheonan-si, KR;

Dongwoon Park, Seoul, KR;

Yongdae Cho, Namyangju-si, KR;

Donghoon Kang, Bucheon-si, KR;

Kisang Eum, Cheonan-si, KR;

Assignee:

SEMES CO., LTD., Cheonan-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 5/02 (2006.01); F17D 1/04 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
B05C 5/0275 (2013.01); B05C 5/0208 (2013.01); F17D 1/04 (2013.01); H10P 72/0452 (2026.01); H10P 72/0458 (2026.01);
Abstract

Provided is an apparatus for processing a substrate. The substrate processing apparatus includes: a processing unit processing a substrate; and a gas supply unit supplying gas to the processing unit, in which the gas supply unit includes a first housing having a first internal space which is in fluid communication with a processing space of the processing unit, a second housing disposed in the first internal space, and having a second internal space which is in fluid communication with the first internal space, and a gas supply duct supplying the gas to the second internal space.


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