The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
Jun. 16, 2022
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Jhih-Bin Chen, Hsinchu, TW;
Ming Chyi Liu, Hsinchu City, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Abstract
A method of making a microlens for a VCSEL device includes forming a first lens layer over a second reflector layer. The first lens layer has a first average concentration of a first element. A first additional reflector layer is formed over the first lens layer. A second lens layer is formed over the first additional reflector layer. The second lens layer has a second average concentration of the first element greater than the first average concentration. A second additional reflector layer is formed over the second lens layer. An oxidation process is performed to oxidize peripheral portions of the first and second lens layers to form oxidized peripheral portions of the first and second lens layer. The oxidized peripheral portions of the second lens layer are wider than the oxidized peripheral portions of the first lens layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile