The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
Aug. 20, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sohee Kim, Suwon-si, KR;
Kyeongtea Bang, Suwon-si, KR;
Hakyoung Kim, Suwon-si, KR;
Seungbin Lim, Suwon-si, KR;
Yongwoo Kim, Suwon-si, KR;
Junghyun Cho, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A gas supply device includes a plurality of flow ratio controllers configured to output a plurality of processing gases supplied from a gas box according to respective predetermined flow ratios; a plurality of switching valve sets connecting the plurality of flow ratio controllers to a plurality of supply pipes connected to a plurality of regions in a chamber or to a bypass pipe; a conductance control valve configured to control conductance of the bypass pipe; and a controller configured to control a processing gas output by one of the plurality of flow ratio controllers to be discharged through the bypass pipe, while a processing gas output by another of the plurality of flow ratio controllers is supplied to the plurality of regions in the chamber, wherein the controller is configured to control the conductance control valve when a processing gas supplied to the plurality of regions is switched.