The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
May. 11, 2021
Seddi, Inc., New York, NY (US);
Igor Santesteban Garay, Madrid, ES;
Miguel Ángel Otaduy Tristán, Madrid, ES;
Dan Casas Guix, Madrid, ES;
Nils Thuerey, Garching, DE;
SEDDI, INC., New York, NY (US);
Abstract
Systems and methods are provided that learn garment deformations such that they are essentially collision free. A diffused, volumetric body model representation of the underlying body together with the construction of a subspace for the garment model that yields a differentiable, canonical space configuration. This subspace is used for the regression of the garment model deformation and its dynamics. In this way, garment model deformations are predicted avoiding collisions, and the complexity for inference is reduced, such that a learned representation yields higher quality than previously achievable. The generated garments exhibit a large amount of spatial and temporal detail, and can be produced extremely quickly via the pre-trained networks.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile