The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2026

Filed:

Sep. 27, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Nicholas Michael Bergantz, San Jose, CA (US);

Andreas Schmid, Sunnyvale, CA (US);

Leon Volfovski, Mountain View, CA (US);

Sanggyum Kim, Sunnyvale, CA (US);

Damon Cox, Jarrell, TX (US);

Paul Wirth, Kalispel, MT (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); B25J 9/16 (2006.01); B25J 11/00 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/681 (2013.01); B25J 9/1692 (2013.01); B25J 11/0095 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); H01L 21/67259 (2013.01); H01L 21/68707 (2013.01);
Abstract

A calibration object is transferred from a processing chamber to an aligner station by one or more robot arms. The calibration object has a first processing chamber orientation in the processing chamber and a second orientation at the aligner station. A first characteristic error value associated with a transfer path between the processing chamber and the aligner is determined based on the first processing chamber orientation and the second orientation of the calibration object at the aligner station. In response to detecting an object at the aligner station to be transferred to the processing chamber along the transfer path, the object is aligned by the aligner station to be placed in the processing chamber according to a target processing chamber orientation based on a target aligner orientation as adjusted by the first characteristic error value determined for the transfer path between the processing chamber and the aligner station.


Find Patent Forward Citations

Loading…