Semiconductor structure having bit line support structure and manufacturing method thereof

Abstract

A semiconductor structure and a manufacturing method thereof are provided. The semiconductor structure includes a substrate, bit line structures distributed at intervals, initial support pattern structures distributed at intervals and target conductive contact structures. The bit line structures distributed at intervals are located on the substrate, and the bit line structures extend along a first direction. Each of the initial support pattern structures runs through top regions of the bit line structures, the initial support pattern structures extend along a second direction, and the first direction intersects with the second direction. Each of the target conductive contact structures is located within adjacent bit line structures and adjacent initial support pattern structures, and each of the target conductive contact structures includes a conductive plug structure and a target protective layer covering an outer sidewall of the conductive plug structure.