Semiconductor memory having discrete active regions and method of making the same

Abstract

The present application provides a method for fabricating a semiconductor memory structure. The method includes: providing a substrate; forming a stack layer on the substrate, and arranging spacer rows in the stack layer, forming a plurality of active lines, and forming a plurality of transfer pillars in the stack layer; forming a spacer structure outside the transfer pillars, and forming an etching hole; etching the second composite mask layer and the initial semiconductor along the etching hole layer of the active lines to form a plurality of discrete active region masks; and etching the substrate along the active region masks to form a plurality of discrete active regions. The disclosed technique can effectively reduce the preparation difficulty of the active area, improve the LCDU of the active area, and improve the performance of the semiconductor structure.