The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2026
Filed:
Nov. 06, 2023
Carl Zeiss Multisem Gmbh, Oberkochen, DE;
Michael Behnke, Oberkochen, DE;
Ulrich Bihr, Oberkochen, DE;
Christof Riedesel, Oberkochen, DE;
Arne Thoma, Oberkochen, DE;
Dirk Zeidler, Oberkochen, DE;
Carl Zeiss MultiSEM GmbH, Oberkochen, DE;
Abstract
A multi-beam charged particle system and a method of setting a working distance WD of the multi beam charged particle system are provided. With the method, the working distance is adjusted while the imaging performance of a wafer inspection task is maintained by computing parameter values of components from predetermined calibration parameter values. The method can allow a relatively fast wafer inspection task even with a wafer stage with a fixed z-position parallel to an optical axis of the multi-beam charged particle system.