The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2026
Filed:
Mar. 18, 2021
Asml Netherlands B.v., Veldhoven, NL;
Yongxin Wang, San Ramon, CA (US);
Zhonghua Dong, San Jose, CA (US);
Xiaoyu Ji, San Jose, CA (US);
Shahedul Hoque, Milpitas, CA (US);
Weiming Ren, San Jose, CA (US);
Xuedong Liu, San Jose, CA (US);
Guofan Ye, South San Francisco, CA (US);
Kuo-Chin Chien, San Jose, CA (US);
ASML Netherlands B. V., Veldhoven, NL;
Abstract
An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.