The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Oct. 20, 2023
Canon Kabushiki Kaisha, Tokyo, JP;
Byung-Jin Choi, Austin, TX (US);
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A method can include bonding a first source die to a first destination site of a destination substrate, wherein the first source die includes a source metrology pattern including a source alignment mark, and the first destination site includes a destination metrology pattern including a destination alignment mark. The method can include collecting radiation data regarding the source and destination metrology patterns within a radiation area. The source alignment mark does not directly overlie or directly underlie any alignment mark of the destination metrology pattern. The method can further include analyzing the radiation data to determine an overlay error between the first source die and the first destination site; and adjusting a position of a second source die or a second destination site of the destination substrate to compensate for the overlay error between the first source die and the first destination site.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile