The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Aug. 26, 2024
Feng Chia University, Taichung, TW;
Dah Young Vacuum Equipment Co., Ltd., Taichung City, TW;
Chang-Ho Yu, Taichung City, TW;
Yao-Kuang Yang, Taichuing City, TW;
Ping-Yen Hsieh, Taichung, TW;
Ying-Hung Chen, Taichung, TW;
Chu-Liang Ho, Taichung, TW;
FENG CHIA UNIVERSITY, Taichung, TW;
DAH YOUNG VACUUM EQUIPMENT CO., LTD., Taichung City, TW;
Abstract
A part is adapted to be used in a semiconductor processing equipment. The part includes a substrate and a protective coating. The protective coating covers at least a part of the substrate, is made of silicon carbide, and has an atomic ratio of carbon in the protective coating increases in a direction away from the substrate while an atomic ratio of silicon in the protective coating decreases in the direction. The atomic ratio of silicon in the protective coating is larger than that of the carbon near the substrate, and the atomic ratio of silicon in the protective coating is smaller than that of carbon near the outer surface of the protective coating. A method for making the part is also provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile