The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Nov. 23, 2021
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Michael Hell, Erlangen, DE;

Caspar Leendertz, Munich, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/832 (2025.01); H01L 21/04 (2006.01); H10D 62/10 (2025.01); H10D 62/17 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8325 (2025.01); H01L 21/046 (2013.01); H10D 62/102 (2025.01); H10D 62/393 (2025.01);
Abstract

A silicon carbide device includes: a planar gate structure on a first surface of a silicon carbide substrate, the planar gate structure having a gate length along a lateral first direction; a source region of a first conductivity type extending under the planar gate structure over at least part of the gate length; a body region of a second conductivity type, the body region including a channel zone that adjoins the source region under the planar gate structure; and a shielding region of the second conductivity type covering the channel zone over at least 20% but less than 100% of the gate length, wherein a maximum dopant concentration in the shielding region is higher than a maximum dopant concentration in the body region.


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