The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2026

Filed:

Jan. 10, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Meng-Han Lin, Hsinchu, TW;

Bo-Feng Young, Taipei, TW;

Sai-Hooi Yeong, Zhubei City, TW;

Chi On Chui, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 51/30 (2023.01); H10D 30/01 (2025.01); H10D 30/67 (2025.01); H10D 30/69 (2025.01); H10D 62/13 (2025.01);
U.S. Cl.
CPC ...
H10B 51/30 (2023.02); H10D 30/031 (2025.01); H10D 30/0415 (2025.01); H10D 30/6755 (2025.01); H10D 30/6757 (2025.01); H10D 30/701 (2025.01); H10D 62/151 (2025.01);
Abstract

A device includes a memory layer over a substrate; a first source/drain structure and a second source/drain structure on the memory layer, wherein the first source/drain structure and the second source drain structure each include a first source/drain layer on the memory layer; a second source/drain layer on the first source/drain layer, wherein the second source/drain layer is different from the first source/drain layer; and a metal layer on the second source/drain layer; and a channel region extending on the memory layer from the first source/drain layer of the first source/drain structure to the first source/drain layer of the second source/drain structure.


Find Patent Forward Citations

Loading…