The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Feb. 24, 2022
Applicant:
Fuji Corporation, Chiryu, JP;
Inventors:
Toshiyuki Ikedo, Nagoya, JP;
Takahiro Jindo, Anjo, JP;
Assignee:
FUJI CORPORATION, Chiryu, JP;
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/48 (2023.01); C02F 1/46 (2023.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H05H 1/247 (2021.05); C02F 1/4608 (2013.01); C02F 2201/4612 (2013.01); H05H 2245/20 (2021.05);
Abstract
A plasma irradiation apparatus including a container configured to store a liquid to be treated; a plasma generating device configured to generate plasma to irradiate the liquid to be treated stored in the container; and a container temperature measuring instrument configured to measure a temperature of the container.
Ikedo, Toshiyuki. (2026). Plasma irradiation apparatus and plasma-treated liquid production method (U.S. Patent No. 12604389). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12604389
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile