The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Jun. 19, 2020
Hitachi High-tech Corporation, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
A plasma processing apparatus including a sample stage; a ring-shaped electrode, made of a conductor, which surrounds the sample stage and to which radio frequency power is supplied; a dielectric cover above the ring-shaped electrode and covering the ring-shaped electrode; a rod suspended and disposed in a through hole disposed on an outer peripheral side portion of the base material having a disc or cylindrical shape and forming the sample stage, and having a connector portion on an upper end portion of the rod connected to the ring-shaped electrode; a beam-shaped member below the sample stage below the through hole with a gap therebetween and extending in a horizontal direction, and which urges the rod upward with respect to the ring-shaped electrode; and a radio frequency power source that is connected to the rod and to the ring-shaped electrode.