The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Oct. 08, 2021
Hitachi Energy Ltd, Zürich, CH;
Marco Bellini, Zürich, CH;
Lars Knoll, Hägglingen, CH;
HITACHI ENERGY LTD, Zürich, CH;
Abstract
A power semiconductor device comprises a drift layer of a first conductivity type, a source layer of the first conductivity type on the drift layer, with an insulated trench gate electrode which extends through the source layer into the drift layer, and an implant layer of a second conductivity type different than the first conductivity type with a homogeneous doping region having a doping variation of at most 8%. The homogeneous doping region is arranged between the source layer and the drift layer and has a homogeneous doping region thickness of at least 150 nm. A method is provided for producing a power semiconductor device with an insulated trench gate electrode.