The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Sep. 29, 2022
Changxin Memory Technologies, Inc., Hefei City, CN;
Yi Tang, Hefei City, CN;
CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei City, CN;
Abstract
A method for forming a semiconductor structure includes the following: a substrate is provided, the substrate including a first area and a second area arranged in sequence in a second direction and T-shaped active pillars located in the first area and the second area and arranged in an array in a first direction and a third direction, the first, second and third directions being perpendicular to one another, and the first and second directions being parallel to a surface of the substrate; T-shaped gate structures located on surfaces of the T-shaped active pillars and bit line structures extending in the third direction are formed in the first area, a plurality of T-shaped gate structures located in the first direction being interconnected; and capacitor structures extending in the second direction is formed in the second area, the bit line structures and the capacitor structures being connected to the T-shaped gate structures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile