The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Jul. 21, 2023
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Galen Gledhill, Portland, OR (US);
Alexander Henstra, Eindhoven, NL;
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/09 (2006.01); H01J 37/147 (2006.01); H01J 37/15 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); H01J 37/09 (2013.01); H01J 37/1471 (2013.01); H01J 37/15 (2013.01); H01J 37/28 (2013.01);
Abstract
Elongated or other non-circular charged-particle beams (CPBs) are used to produce substrate images that can be processed such as by deconvolution to produce a final image. In some cases, first and second images associated with an asymmetric CPB beams aligned along parallel axes are deconvolved and then combined to produce the final image or combined and then deconvolved to produce the final image. Milling or other processing can be performed by aligning an asymmetric CPB with respect to a CPB scan or processing direction.