The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Nov. 21, 2023
International Business Machines Corporation, Armonk, NY (US);
Choong Ho Lee, Hopewell Junction, NY (US);
Donguk Choi, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Detecting mask defects during semiconductor processing includes scanning, by one or more processors, a wafer during a lithography process of semiconductor processing. A first chip of a plurality of chips on the wafer is compared with a neighboring chip. In response to detecting a defect on the first chip during the comparison, a location of the defect on the first chip is stored by the one or more processors. The one or more processors select a second chip of the plurality of chips closest to a center of the wafer and scan the second chip storing inspection data corresponding to the second chip. The inspection data from the second chip is then compared with mask pattern data, and in response to the inspection data from the second chip matching the mask pattern data, the one or more processors allow the lithography process to continue.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile