The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Apr. 10, 2025
Cosmo Institute of Industrial Intelligence (Qingdao) Co., Ltd., Qingdao, CN;
Cosmoplat Iot Technology Co., Ltd., Qingdao, CN;
Lucheng Chen, Qingdao, CN;
Deyan Liu, Qingdao, CN;
Chao Wang, Qingdao, CN;
Chenggang Qin, Qingdao, CN;
Lin Wang, Qingdao, CN;
Qingze Tian, Qingdao, CN;
Xiang Li, Qingdao, CN;
COSMO INSTITUTE OF INDUSTRIAL INTELLIGENCE (QINGDAO) CO., LTD., Qingdao, CN;
COSMOPlat IoT Technology Co., Ltd., Qingdao, CN;
Abstract
The present application pertains to the field of data processing technology, specifically relates to a method, apparatus and device for optimizing a process parameter and a storage medium, which includes: using a first weight parameter of a pre-trained support vector regression model for a manufacturing equipment as an iterative initial value, and calculating a second weight parameter of a support vector regression model using an online proximal gradient algorithm based on training data; obtaining an optimized support vector regression model by updating the first weight parameter of the pre-trained support vector regression model to the second weight parameter; inputting a first process parameter of the manufacturing equipment into the optimized support vector regression model to obtain a first detection parameter output by the optimized support vector regression model; and calculating, according to the first process parameter and the first detection parameter, a target process parameter for the manufacturing equipment.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile