The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Oct. 26, 2021
Applicant:

Siltronic Ag, Munich, DE;

Inventors:

Sebastian Andres, Marktl, DE;

Robert Hinterleuthner, Burghausen, DE;

Rudolf Rupp, Oberjulbach, DE;

Assignee:

SILTRONIC AG, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/02 (2024.01); G01N 23/2208 (2018.01); G01N 23/2252 (2018.01); G01N 15/00 (2006.01);
U.S. Cl.
CPC ...
G01N 15/02 (2013.01); G01N 23/2208 (2013.01); G01N 23/2252 (2013.01); G01N 2015/0038 (2013.01); G01N 2223/079 (2013.01); G01N 2223/1016 (2013.01); G01N 2223/102 (2013.01); G01N 2223/3037 (2013.01); G01N 2223/304 (2013.01); G01N 2223/418 (2013.01); G01N 2223/6116 (2013.01); G01N 2223/641 (2013.01); G01N 2223/652 (2013.01);
Abstract

Unknown particles on a surface of a semiconductor wafer are classified by applying a range of particles of known chemical composition and different sizes onto a test wafer, measuring the sizes of a plurality of the particles and spectrally analyzing a makeup of the particles by energy-dispersive x-ray spectroscopy, followed by ascertaining a substantive content therefrom; creating a best-fit curve to the size and substantive content of the particles; measuring the particle size of an unknown particle and recording its spectrum by energy-dispersive x-ray spectroscopy and classifying the unknown particle as the result of a comparison of the size and the substantive content of the unknown particle with the best-fit curve.


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