The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2026
Filed:
May. 02, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Geetika Bajaj, Cupertino, CA (US);
Yixiong Yang, Fremont, CA (US);
Seshadri Ganguli, Sunnyvale, CA (US);
Tuerxun Ailihumaer, Santa Clara, CA (US);
Yogesh Sharma, Sunnyvale, CA (US);
Tianyi Huang, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods of depositing a metal film by exposing a substrate surface to a halide precursor and an organosilane reactant are described. The halide precursor comprises a compound of general formula (I): MQR, wherein M is a metal, Q is a halogen selected from Cl, Br, F or I, z is from 1 to 6, R is selected from alkyl, CO, and cyclopentadienyl, and m is from 0 to 6. The aluminum reactant comprises a compound of general formula (II) or general formula (III): wherein R, R, R, R, R, R, R, R, R, R, R, R, R, and Rare independently selected from hydrogen (H), substituted alkyl or unsubstituted alkyl; and X, Y, X', and Y′ are independently selected from nitrogen (N) and carbon (C).