The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2026
Filed:
Jun. 28, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Yaoying Zhong, Singapore, SG;
Siew Kit Hoi, Singapore, SG;
John Klocke, Kalispell, MT (US);
Bridger Earl Hoerner, Columbia Falls, MT (US);
Assignee:
Applied Materials Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); C23C 14/54 (2006.01); C23C 16/52 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
C23C 14/54 (2013.01); C23C 16/52 (2013.01); G06T 7/0008 (2013.01); H01L 22/12 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Methods and apparatus for processing a substrate are provided herein. For example, a method comprises in a process chamber, processing a substrate in a presence of an electric field, subsequently capturing an image of the substrate, determining whether substrate arcing occurred based upon analysis of the captured image, and one of continuing processing of the substrate when no arcing is determined or stopping processing of the substrate when arcing is determined.