The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

May. 21, 2021
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Ryo Sugiyama, Tokyo, JP;

Kenji Tanimoto, Tokyo, JP;

Shuhei Ishikawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/07 (2006.01); H01J 37/063 (2006.01); H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
H01J 37/07 (2013.01); H01J 37/063 (2013.01); H01J 37/08 (2013.01); H01J 2237/038 (2013.01); H01J 2237/04735 (2013.01); H01J 2237/061 (2013.01);
Abstract

Provided are a structure for particle acceleration and a charged particle beam apparatus, which enable the suppression of electric field concentration occurring near a negative electrode part. The structure for particle acceleration includes: a ceramic bodyhaving a through holeformed by an inner wall surface; and a negative electrodeand a positive electrodewhich are arranged, respectively, on one end and the other end of the through holein the ceramic body. The inner wall surface of the ceramic bodyis configured such that a first region, which is electrically connected with the negative electrode, and a second region, which is electrically connected with the positive electrode, are electrically connected to each other. The surface resistivity of the first regionis lower than the surface resistivity of the second region


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