The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Feb. 16, 2024
Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);
John B. Putman, Celebration, FL (US);
Matthew C. Putman, Brooklyn, NY (US);
Jonathan Lee, Brooklyn, NY (US);
Sarah Constantin, Brooklyn, NY (US);
Damas Limoge, Brooklyn, NY (US);
Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);
Abstract
A computing system receives one or more process parameters to be optimized during a multi-step manufacturing process. The computing system initiates a process prediction model in accordance with the one or more process parameters. The computing system simulates the multi-step manufacturing process using a plurality of sets of different setpoints until the one or more process parameters are optimized. The computing system identifies a first set of setpoints from the plurality of sets of different setpoints that optimized the one or more process parameters. The computing system causes the station controller to apply the first set of setpoints to the one or more stations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile