The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Feb. 15, 2023
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Daisuke Kori, Joetsu, JP;

Shohei Iwamori, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 4/00 (2006.01); C07C 43/215 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
C09D 4/00 (2013.01); G03F 7/0048 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); G03F 7/167 (2013.01); G03F 7/2004 (2013.01); G03F 7/2016 (2013.01); G03F 7/2043 (2013.01); G03F 7/26 (2013.01);
Abstract

A composition for forming an organic film, including: a compound represented by the following general formula (1); and an organic solvent, wherein in the general formula (1), X represents any one group of X1 to X3 represented by the following general formulae (2), (3), and (5), and two or more kinds of X are optionally used in combination, wherein in the general formula (3), W represents a carbon atom or a nitrogen atom; 'n1' represents 0 or 1; “n2” represents an integer of 1 to 3; and Rindependently represents any one of groups represented by the following general formula (4), and wherein in the general formula (5), Rrepresents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and Rrepresents any one of the following groups.


Find Patent Forward Citations

Kori, Daisuke. (2026). Composition for forming organic film, patterning process, and compound (U.S. Patent No. 12584023). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12584023

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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