The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Mar. 31, 2023
Tokyo Electron Limited, Tokyo, JP;
Koki Tanaka, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma etching apparatus includes: a chamber; a support configured to support a substrate in the chamber; a gas supply configured to supply a processing gas into the chamber, the processing gas including hydrogen fluoride gas with a volume flow ratio of 30% or more with respect to a total flow rate of the processing gas; a plasma generator configured to generate a plasma from the processing gas in the chamber to etch the substrate with the plasma; and a cooler configured to maintain the support at 0° C. or lower during generation of the plasma.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile