The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Jun. 25, 2020
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Karl Frederick Leeser, West Linn, OR (US);
Lee Chen, Cedar Creek, TX (US);
Yukinori Sakiyama, West Linn, OR (US);
Assignee:
LAM RESEARCH CORPORATION, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/26 (2006.01); C23C 16/505 (2006.01); C23C 16/515 (2006.01); C23C 16/517 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); C23C 16/26 (2013.01); C23C 16/505 (2013.01); C23C 16/515 (2013.01); C23C 16/517 (2013.01); H01J 37/32082 (2013.01); H01J 37/32422 (2013.01); H01J 37/32449 (2013.01); H01L 21/02115 (2013.01); H01J 2237/332 (2013.01);
Abstract
A substrate processing tool capable of forming an carbon layer on a substrate by generating a plasma including carbon and non-carbon ions in a processing chamber, suspending the carbon and non-carbon ions in the processing chamber, removing mostly the suspended non-carbon ions from the processing chamber, and bombarding the substrate surface with mostly carbon ions. The one or more steps of the above sequence may be repeated until the carbon layer is of desired thickness.