The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Oct. 31, 2023
Applicant:

Canon Anelva Corporation, Kawasaki, JP;

Inventors:

Susumu Karino, Tokyo, JP;

Tetsuro Toda, San Jose, CA (US);

Tooru Fujihara, Tokyo, JP;

Assignee:

Canon Anelva Corporation, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/22 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3417 (2013.01); C23C 14/225 (2013.01); C23C 14/352 (2013.01); H01J 37/3408 (2013.01); H01J 37/3435 (2013.01); H01J 37/347 (2013.01);
Abstract

A sputtering apparatus includes a first target holder configured to hold a first target such that a first surface of the first target faces the processing space, and a second target holder configured to hold a second target such that a second surface of the second target faces the processing space, wherein the first target holder holds the first target such that an orthogonal projection vector of a first normal vector, which is a normal vector of the first surface, with respect to a virtual plane including the substrate holding surface is directed to a direction away from the substrate, and the second target holder holds the second target such that an orthogonal projection vector of a second normal vector, which is a normal vector of the second surface, with respect to the virtual plane is directed to a direction away from the substrate.


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