The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Jan. 25, 2023
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventors:

Thomas Kalkbrenner, Jena, DE;

Joerg Siebenmorgen, Jena, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/008 (2013.01); G02B 21/0032 (2013.01); G02B 21/0072 (2013.01);
Abstract

A method, an arrangement for microscopy and a microscope for three-dimensional imaging in microscopy, in which aberrations of a specimen detection radiation coming from a specimen are corrected in a detection beam path by means of a correction element and the corrected specimen detection radiation is captured in a spatially resolved form. The inventions are distinguished by the fact that a best-possible correction setting of the correction element, with which aberrations occurring at the time are reduced as much as possible, is determined; and, on the basis of the best-possible correction setting, a flawed correction setting is determined, a setting with which aberrations occurring lead to an asymmetric point spread function of the specimen detection radiation.


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