The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Dec. 20, 2021
The Regents of the University of California, Oakland, CA (US);
Ravit Silverstein, Golea, CA (US);
Frank W. Zok, Goleta, CA (US);
Carlos G. Levi, Santa Barbara, CA (US);
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);
Abstract
A two-step synthesis of SiC including initial exposure of carbon surfaces to Si vapor, followed by Si melt infiltration, is described herein. Interrupted differential thermal analysis (DTA) of amorphous C and Si powder mixtures and microstructure characterization are used to identify the stages of the reaction. Exposure to Si vapor yields a SiC layer with nanoscale porosity driven by the volume change associated with the reaction. This forms a continuous pore network that promotes subsequent melt access to the reaction front with the C. While the pores remain open, the vapor phase reaction proceeds at a nearly-constant rate and exhibits a strong temperature sensitivity, the latter due largely to the temperature sensitivity of the Si vapor pressure. The implications for enhancing the reactive melt infiltration process and fabrication of SiC matrices for ceramic composites are discussed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile