The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Jun. 28, 2024
Changwon National University Industry Academy Cooperation Corps, Changwon-si, KR;
CHANGWON NATIONAL UNIVERSITY INDUSTRY ACADEMY COOPERATION CORPS, Changwon-si, KR;
Abstract
The present invention relates to a method of manufacturing a micropattern surface with a reentrant structure with hydrophobicity and oleophobicity through a simple process using capillary force. The method of the present invention includes a step of forming a resin layer by applying an ultraviolet rays (UV) curable resin on a first substrate; a step of forming a pillar-shaped fine pattern on a second substrate; a step of bringing the resin layer and the fine pattern into contact with each other by moving the first substrate or the second substrate so that the resin layer and the fine pattern face each other; and a step of curing the resin by radiating ultraviolet rays while the resin located around a pillar of the fine pattern moves a certain distance along the pillar in the longitudinal direction of the pillar of the fine pattern by capillary force.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile