The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Feb. 18, 2021
Applicants:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Kochi Prefectural Public University Corporation, Kochi, JP;

Inventors:

Hiroshi Hashigami, Annaka, JP;

Toshiyuki Kawaharamura, Nankoku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 17/06 (2006.01);
U.S. Cl.
CPC ...
B05B 17/06 (2013.01);
Abstract

An atomizing apparatus for film formation enabling high-quality thin film formation with suppressed particle adhesion, including: a raw-material container accommodating a raw-material solution; a cylindrical member connecting inside the raw-material container to an outer unit, and disposed so a lower end of the cylindrical member does not touch a liquid surface of the raw-material solution in the container; an ultrasound generator having at least one source emitting ultrasound; and a liquid tank where the ultrasound propagates the raw-material solution through a middle solution. The generation source is outside the liquid tank and has a center between a plane extending from an inner side wall of the raw-material container and a plane extending from an outer side wall of the cylindrical member. A center line of an ultrasound-emitting surface of the ultrasound generation source is designated as u, wherein the center line u does not intersect the cylindrical member side wall.


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