The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Jun. 23, 2023
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Anupam Dutta, Kolkata, IN;

Satyasuresh Vvss Choppalli, Bangalore, IN;

Rui Tze Toh, Singapore, SG;

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/528 (2006.01); H01L 25/065 (2023.01); H01L 29/78 (2006.01); H10D 30/69 (2025.01);
U.S. Cl.
CPC ...
H01L 23/481 (2013.01); H01L 21/76898 (2013.01); H01L 23/5226 (2013.01); H01L 23/5283 (2013.01); H01L 25/0657 (2013.01); H10D 30/711 (2025.01); H01L 2225/06544 (2013.01);
Abstract

Disclosed structures and methods include a top chip flipped relative to a bottom chip and bonded thereto. On the top chip, dielectric material layers separate a transistor from the bottom chip. The transistor includes source and drain regions; a body region on a channel region between the source and drain regions; and a gate structure adjacent to and between the channel region and the dielectric material layers. Alternatively, the transistor includes: a source region between drain regions; a body region on a channel region between the source region and each drain region; and gate structures adjacent to and between the channel regions and the dielectric material layers. The first chip also includes an insulator layer on the transistor opposite the dielectric material layers, a trench in the insulator layer extending to the source and body regions, and a local interconnect at the bottom of the trench.


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