The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Sep. 19, 2022
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Boris Sherman, Rehovot, IL;

Boris Levant, Rehovot, IL;

Ran Yacoby, Jerusalem, IL;

Botser Reshef, Shoham, IL;

Tomer Yeminy, Givat Shmuel, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06V 10/74 (2022.01); G06V 10/75 (2022.01); G06V 10/774 (2022.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06V 10/759 (2022.01); G06V 10/761 (2022.01); G06V 10/774 (2022.01); G06T 2207/20081 (2013.01); G06T 2207/20224 (2013.01); G06T 2207/30148 (2013.01);
Abstract

There is provided a system and method for defect examination on a semiconductor specimen. The method comprises obtaining an original image of the semiconductor specimen, the original image having a first region annotated as enclosing a defective feature; specifying a second region in the original image containing the first region, giving rise to a contextual region between the first region and the second region; identifying in a target image of the specimen a set of candidate areas matching the contextual region in accordance with a matching measure; selecting one or more candidate areas from the set of candidate areas; and pasting the first region or part thereof with respect to the one or more candidate areas, giving rise to an augmented target image usable for defect examination on the semiconductor specimen.


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