The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Nov. 28, 2022
Applicant:

Rohm and Haas Electronic Materials Korea Ltd., Cheonan-si, KR;

Inventors:

Yoo-Jin Ghang, Cheonan-si, KR;

Jae-Yun Ahn, Cheonan-si, KR;

You Rim Shin, Cheonan-si, KR;

Jung-June Lee, Cheonan-si, KR;

Jae-Hwan Sim, Cheonan-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08F 220/68 (2006.01); C08F 222/20 (2006.01); C09D 133/16 (2006.01); C09D 135/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08F 220/68 (2013.01); C08F 222/20 (2013.01); C09D 133/16 (2013.01); C09D 135/02 (2013.01);
Abstract

A composition comprising a polymer, the polymer comprising: repeating units derived from a monomer of Formula A1, Formula A2, or Formula A3, repeating units derived from a monomer of Formula B1, Formula B2, Formula B3, or Formula B4, and repeating units derived from a monomer of Formula C1 or Formula C2, the structures of each as described herein. A coated substrate including a substrate, a photoresist underlayer formed from composition above, and a photoresist layer on the photoresist underlayer.


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