The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Mar. 23, 2023
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Steven Holmes, Red Hook, NY (US);

Pouya Hashemi, Purchase, NY (US);

Robert L. Bruce, White Plains, NY (US);

Eric A. Joseph, Croton on Hudson, NY (US);

Yanning Sun, Scarsdale, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01F 41/22 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0015 (2013.01); G03F 7/0002 (2013.01); H01J 37/3053 (2013.01); H01F 41/22 (2013.01);
Abstract

A semiconductor structure includes a first plurality of slanted features within a first region of a substrate. Two or more magnetic guiding structures are embedded within the first region of the substrate. The first plurality of slanted features is located between the two or more magnetic guiding structures for varying a magnetic field strength around the first plurality of slanted features. A second plurality of slanted features are located within a second region of the substrate. The second region of the substrate is adjacent to the first region of the substrate. The second plurality of slanted features include a second orientation angle that is different from a first orientation angle of the first plurality of slanted features.


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