The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2026

Filed:

May. 31, 2023
Applicant:

Powertech Technology Inc., Hsinchu County, TW;

Inventors:

Pei-Chun Tsai, Hsinchu County, TW;

Hung-Hsin Hsu, Hsinchu County, TW;

Shang-Yu Chang Chien, Hsinchu County, TW;

Chia-Ling Lee, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10W 42/20 (2026.01); H10W 70/60 (2026.01); H10W 74/01 (2026.01); H10W 74/10 (2026.01); H10W 90/00 (2026.01); H10W 72/00 (2026.01); H10W 72/30 (2026.01); H10W 74/15 (2026.01); H10W 80/00 (2026.01);
U.S. Cl.
CPC ...
H10W 90/00 (2026.01); H10W 42/20 (2026.01); H10W 70/60 (2026.01); H10W 70/611 (2026.01); H10W 74/016 (2026.01); H10W 74/019 (2026.01); H10W 74/111 (2026.01); H10W 90/401 (2026.01); H10W 90/701 (2026.01); H10W 72/07352 (2026.01); H10W 72/327 (2026.01); H10W 74/142 (2026.01); H10W 74/15 (2026.01); H10W 80/314 (2026.01); H10W 90/724 (2026.01); H10W 90/734 (2026.01); H10W 90/736 (2026.01);
Abstract

A stacked package structure and a manufacturing method thereof are provided. The stacked package structure includes an upper redistribution layer, a first chip, and an upper molding layer. The first chip is disposed on the upper redistribution layer and is electrically connected to the upper redistribution layer. The upper molding layer is disposed on the first chip and the upper redistribution layer, and is configured to package the first chip. The upper molding layer includes a recess, the recess is recessed relative to a surface of the upper molding layer away from the upper redistribution layer, and the recess is circumferentially formed around a periphery of the upper molding layer.


Find Patent Forward Citations

Loading…