The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2026
Filed:
Mar. 29, 2022
International Business Machines Corporation, Armonk, NY (US);
Ruilong Xie, Niskayuna, NY (US);
Dechao Guo, Niskayuna, NY (US);
Kisik Choi, Watervliet, NY (US);
Oleg Gluschenkov, Tannersville, NY (US);
Shogo Mochizuki, Mechanicville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A first and a second nanosheet stack, a first source drain to the first nanosheet stack, a carrier wafer bonded to an upper surface, a bottom source drain contact located on a bottom surface of the first source drain, an epitaxial region between the bottom source drain contact and the first source drain, a second source drain adjacent to the second nanosheet stack and a top source drain contact located on an upper surface of the second source drain, the bottom source drain contact and the top source drain contact on opposite sides. Forming a first and a second nanosheet stack, forming an upper top source drain contact to first source drain adjacent to the first nanosheet stack, bonding a carrier wafer to an upper surface and forming a bottom source drain contact to a lower horizontal surface of a second source drain adjacent to the second nanosheet stack.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile