The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2026
Filed:
Jan. 13, 2023
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Markus Bauer, Schneckenlohe, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/74 (2012.01); G03F 1/84 (2012.01);
U.S. Cl.
CPC ...
G03F 1/74 (2013.01); G03F 1/84 (2013.01);
Abstract
A method for repairing at least one defect of a lithographic mask comprises the step of: ascertaining parameters of at least one repair shape for the at least one defect, wherein ascertaining parameters comprises: allocating at least one numerical value to a parameter, wherein the numerical value deviates from the numerical value predefined by the at least one defect for said parameter.