The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Apr. 20, 2023
Semes Co., Ltd., Chungcheongnam-do, KR;
Young Seo An, Gyeonggi-do, KR;
Jae Hoon Park, Gyeonggi-do, KR;
Young Ju Jo, Gyeonggi-do, KR;
Kyung Jin Seo, Chungcheongnam-do, KR;
Seo Jung Park, Gyeonggi-do, KR;
Dae Myeong Lee, Busan, KR;
Jae Hyun Lim, Chungcheongnam-do, KR;
Nam Kyu Kim, Chungcheongnam-do, KR;
SEMES CO., LTD., Chungcheongnam, KR;
Abstract
A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; and a bowl member surrounding the spin chuck, wherein the bowl member includes: a first bowl including an inclined surface inclined downward in an outward direction and having an upper surface of which at least a portion has a curvature; and an upper base disposed on the first bowl, a space between the upper surface of the first bowl and a lower surface of the upper base forms a first flow passage and at least a portion of the first flow passage is formed in an arc shape along the upper surface of the first bowl, and the rinse liquid is supplied toward the inclined surface of the first bowl through the first flow passage.