The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
May. 19, 2023
Tokyo Electron Limited, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A monitoring method includes steps of (a) placing a substrate on a mounting stage of a processing chamber of a plasma processing apparatus; (b) supplying a pulsed wave of RF power with a predetermined duty ratio from an RF power supply connected to an antenna; and (c) monitoring a plasma state based on a converted value of a Vpp voltage of an output terminal of a matching unit arranged between the antenna and the RF power supply. The converted value of the Vpp voltage is obtained by converting the Vpp voltage of the output terminal voltage based on the duty ratio, the RF power, and correlation information indicating a correlation between the Vpp voltage and the RF power.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile