The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Apr. 10, 2023
Insidix, Seyssins, FR;
Régis Braisaz, Réaumont, FR;
Pierre Vernhes, Saint-Martin-d'Uriage, FR;
INSIDIX, Noyarey, FR;
Abstract
A topographic measurement method includes provision of a sample including first surface provided with plurality of salient patterns. The first surface of the sample is illuminated by means of structured light that defines several repetitive patterns. The structured light is emitted at first angle with respect to first surface. A first image of first surface of sample illuminated by structured light is acquired. The first image is acquired at second angle with respect to first surface. A second image of illuminated sample is acquired. The second image differs from first image by value of exposure time. The first image is compared with second image to determine presence of at least one artefact on the first image. A reference image is formed from the first image and the second image. The reference image is devoid of any artefact. A quantity representative of the first surface is calculated from the reference image.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile