The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Dec. 08, 2021
Applicant:

The 13th Research Institute of China Electronics Technology Group Corporation, Shijiazhuang, CN;

Inventors:

Shujie Wang, Shijiazhuang, CN;

Niefeng Sun, Shijiazhuang, CN;

Senfeng Xu, Shijiazhuang, CN;

Tongnian Sun, Shijiazhuang, CN;

Huisheng Liu, Shijiazhuang, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 33/02 (2006.01); C30B 29/40 (2006.01);
U.S. Cl.
CPC ...
C30B 33/02 (2013.01); C30B 29/40 (2013.01);
Abstract

A preparation device and method of semi-insulated indium phosphide belong to the field of crystal preparation. The preparation device includes a furnace body, and a crucible, an injector and an in-situ annealing device within the furnace body. The method includes: A, heating indium to form an indium melt; B, filling the furnace body with hydrogen of 0.02-0.3MPa and holding the pressure for 1-5 hours, and covering the surface of the melt with liquid boron oxide; C, filling the furnace body with an inert gas of 6-15MPa; D, injecting a phosphorus gas into the indium melt by the injector; E, growing a crystal; and F, annealing the crystal within the in-situ annealing device.


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