The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Aug. 26, 2021
Applicant:
Versum Materials Us, Llc, Tempe, AZ (US);
Inventors:
Assignee:
Versum Materials US, LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/37 (2006.01); C11D 1/22 (2006.01); C11D 1/72 (2006.01); C11D 1/83 (2006.01); C11D 3/00 (2006.01); C11D 3/04 (2006.01); C11D 3/20 (2006.01);
U.S. Cl.
CPC ...
C11D 1/22 (2013.01); C11D 1/72 (2013.01); C11D 1/83 (2013.01); C11D 3/0047 (2013.01); C11D 3/0073 (2013.01); C11D 3/046 (2013.01); C11D 3/2075 (2013.01); C11D 2111/22 (2024.01);
Abstract
The present invention provides a cleaning composition comprises water; one or more organic acid; at least two surfactants wherein the first type surfactant is a diphenyl disulfonic surfactant, the second type surfactant has a surface tension of less than 50 dynes/cm at 0.01 wt % concentration in water, and the second type surfactant is not the first type surfactant; and optionally fluoride compounds, polymers, corrosion inhibitors, biological preservatives, pH adjusting agents.
Tamboli, Dnyanesh. (2026). Post chemical mechanical planarization (cmp) cleaner comprising an organic acid/anionic surfactant mixture (U.S. Patent No. 12559699). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12559699
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile